This research was funded by the Research Management Office (DGI) of the Pontificia Universidad Católica del Perú (PUCP). The authors have been supported by the PUCP under the PhD scholarship program Huiracocha (J A Guerra) and by the National Council of Science and Technology (CONCYTEC) under the scholarships granted to the PUCP (J R Angulo and J Llamoza). The author would like to thank Prof Dr H P Strunk, F Benz and Dr Y Weng of the University of Stuttgart for the TEM measurements.

We report the complex refractive index of methylammonium lead iodide (CH3NH3PbI3) perovskite thin films obtained by means of variable angle spectroscopic ellipsometry and transmittance/reflectance spectrophotometry in the wavelength range of 190 nm to 2500 nm. The film thickness and roughness layer thickness are determined by minimizing a global unbiased estimator in the region where the spectrophotometry and ellipsometry spectra overlap. We then determine the optical bandgap and Urbach energy from the absorption coefficient, by means of a fundamental absorption model based on band fluctuations in direct semiconductors. This model merges both the Urbach tail and the absorption edge regions in a single equation. In this way, we increase the fitting region and extend the conventional (αℏω)2-plot method to obtain accurate bandgap values. © 2017 Author(s).

This research was funded by the Research Management Office (DGI) of the Pontificia Universidad Católica del Perú (PUCP). The authors have been supported by the PUCP under the PhD scholarship program Huiracocha (J.A. Guerra), the “Programa de repatriación” (J.A. Töfflinger), the Master scholarship (L.M. Montañez and K. Tucto) from CONCYTEC and the “Círculo de investigación” from CONCYTEC. The authors would like to thank Prof. Dr. A. R. Zanatta (IFSC-USP, Brazil) for providing access to his lab in order to perform the PL measurements and Prof. Dr. H. P. Strunk (University of Stuttgart, Germany) for helping us with the PLE measurements.

We report on the optical bandgap engineering of sputtered hydrogenated amorphous silicon carbide (a-SiC:H) thin films under different hydrogen dilution conditions during the deposition process and after post-deposition annealing treatments. The Tauc-gap and Urbach energy are calculated from ultraviolet-visible optical transmittance measurements. Additionally, the effect of the thermal annealing temperature on the hydrogen out-diffusion is assessed through infra-red absorption spectroscopy. A new model for the optical absorption of amorphous semiconductors is presented and employed to determine the bandgap as well as the Urbach energy from a single fit of the absorption coefficient. This model allowed the discrimination of the Urbach tail from the Tauc region without any external bias. Finally, the effect of the hydrogen dilution on the band-edge and the Urbach focus is discussed.

The authors would like to acknowledge the financial support of the Peruvian science foundation Cienciactiva in the framework of the DAAD-CONCYTEC joint project (2017-2019), the “Círculo de investigación” project and the Research Management Office (DGI) of the Pontificia Universidad Católica del Perú (PUCP). The research activity was performed in the framework of the doctoral scholarship of K. Tucto and L. Flores from CONCYTEC under the contract numbers 012-2013-FONDECYT and 000236-2015-FONDECYT-DE, respectively. The authors are also grateful to the Center of Microcharacterization (CAM) of the PUCP for the EDX and PL measurements.

This work was funded by the Peruvian science foundation FONDECYT under the projects “Círculos de investigación en ciencia y tecnología-2”, contract number 011-2014 and under the cooperation project with the German academic exchange service (DAAD), contract number 035-2016. The authors also gratefully acknowledge the support of Karem Tucto and Loreleyn Flores by CONCYTEC under the contract numbers 012-2013-FONDECYT and 000236-2015-FONDECYTDE, respectivley.

Terbium-doped aluminum nitride thin films have been deposited by radio frequency magnetron sputtering. The influence of annealing treatments on structural, morphological and luminescence properties of the films is examined with the aim to optimize post-deposition annealing conditions. Temperatures starting from 500 up to 1000°C using two annealing techniques were investigated: rapid thermal processing and quartz tube furnace. X-ray diffraction analysis revealed the formation of aluminum oxide and aluminum oxynitride phases at temperatures higher than 750°C. The oxygen content in the surface layer was measured with energy dispersive X-ray. The terbium emission was obtained after excitation either by photons or electrons. The films treated with rapid thermal processing at 750°C resulted in the highest emission. © 2017 Trans Tech Publications, Switzerland.

This work was supported by the Peruvian science foundation CIENCIACTIVA of CONCYTEC and DAAD-CONCYTEC project (2017–2019). The Research Management Office (DGI) of the the Pontificia Universidad Católica del Perú (PUCP) project 492-2017. The research activity was performed in the framework of the doctoral scholarship of L. F. Flores under the contract number 236-2015-FONDECYT. The authors are also thankful to the Center of Materials Characterization (CAM) and the Institute of Corrosion and Protection (ICP) of the PUCP for the EDX, PL and FTIR measurements.