Analytical Study of the Thermal Activation of Tb Doped Amorphous SiC:H Thin Films

• Autores: Guerra Torres, Jorge Andrés, Tucto K., Montañez L.M., De Zela F., Töfflinger J.A., Winnaker A., Weingärtner R.
• Formato: objeto de conferencia
• Fecha de Publicación: 2016
• Institución: Consejo Nacional de Ciencia Tecnología e Innovación
• Repositorio: CONCYTEC-Institucional
• Lenguaje: inglés
• OAI Identifier: oai:repositorio.concytec.gob.pe:20.500.12390/515
• Enlace del recurso: https://hdl.handle.net/20.500.12390/515; https://doi.org/10.1557/adv.2016.464
• Nivel de acceso: acceso abierto
• Materia: Thin films; Amorphous materials; Annealing; Chemical activation; Luminescence; Silicon carbide; Terbium; Light emission intensity; Luminescence enhancements; Optically active ions; Rate-equation models; Amorphous films; https://purl.org/pe-repo/ocde/ford#1.03.00

This research was funded by the Research Management Office (DGI) of the Pontificia Universidad Católica del Perú (PUCP). The authors have been supported by the PUCP under the PhD scholarship program Huiracocha (J.A. Guerra), the “Programa de repatriación” (J.A. Töfflinger), the Master scholarship (L.M. Montañez and K. Tucto) from CONCYTEC and the “Círculo de investigación” from CONCYTEC. The authors would like to thank Prof. Dr. A. R. Zanatta (IFSC-USP, Brazil) for providing access to his lab in order to perform the PL measurements and Prof. Dr. H. P. Strunk (University of Stuttgart, Germany) for helping us with the PLE measurements.