OPTIMIZATION OF THE REMOVAL OF PERSISTENT ORGANIC COMPOUNDS THROUGH THE PHOTO-FENTON PROCESS

• Autores: Gutiérrez, César, Pilco, Alex
• Formato: artículo
• Fecha de Publicación: 2020
• Institución: Sociedad Química del Perú
• Repositorio: Revista de la Sociedad Química del Perú
• Lenguaje: español
• OAI Identifier: oai:rsqp.revistas.sqperu.org.pe:article/273
• Enlace del recurso: http://revistas.sqperu.org.pe/index.php/revistasqperu/article/view/273
• Nivel de acceso: acceso abierto
• Materia: Photo-Fenton; textile wastewater; experiment design; chemical oxygen demand; Foto-Fenton; agua residual textil; diseño de experimentos; emanda química de oxígeno

The response surface methodology was applied to evaluate the optimal experimental conditions to remove persistent organic compounds from a synthetic textile wastewater using a batch photochemical reactor on a laboratory scale. Four factors at three levels were studied: Fenton H2O2/Fe2+ reagent ratio (11,25, 18,75, 26,25 mg/L/mg/L), UV lamp power (4, 11, 18 W), pH (2, 3, 4) and treatment time (60, 120, 180 min). The optimum levels found for the four factors were: ratio of Fenton H2O2/Fe2+ reagents equal to 17 mg/L/mg/L, UV lamp power equal to 4 W, pH equal to 3 and treatment time of 180 min. It was found that the photo- Fenton process is very effective in treating synthetic textile wastewater, with a removal of 86 %, with respect to COD.