The objective of this research work is to esrtimate soil salinity in rice crop areas in Lambayeque district and investigate the temporal and spatial behavior, using ETM+ sensor (LandSat-7) satellite images, MODIS sensor (TERRA) and data obtained from electrical conductivity (EC) of the soil in situ. For this purpose, normalized dierence vegetation index (NDVI), soil salinity index (IndSal) and the standardized anomaly of the NDVI were the analysed parameters. The maximun compound value (MVC) analysis of the NDVI and soil salinity index, the standard deviation of the NDVI and soil salinity index from ETM+ sensor and standardized anomalies from ETM+ and MODIS sensors allowed to separate high quality soils from those with salinity problems. Based on the MVC de NDVI and soil salinity index it was obtained 12 864.24 ha and 12 567.96 ha respectively belonging to rice crop areas, the standard d...

The fogs form the vegetation of the Lomas, which are natural harvesters of fog water, the areas with the greatest vegetation, are the areas with the highest concentration of fog. An important characteristic in the Lomas is that altitude is the most important predictor of its plant richness, therefore to find the places with highest concentrations of fog, vegetation, and altitude are analyzed. The satellite data that give information on plant vigor and altitude of the Lomas are: the Normalized Vegetation Index (NDVI) and the Digital Elevation Model (DEM), with these data the vegetation of the Lomas, is located, then the correlation is analyzed between NDVI and altitude through topographic profiles that cross the most important Lomas of the coast. The results show that the NDVI increases with increasing altitude, reaching a maximum point from which the NDVI decreases as the altitude contin...

Microelectronic fabrication of Si typically involves high-temperature or high-energy processes. For instance, wafer fabrication, transistor fabrication, and silicidation are all above 500°C. Contrary to that tradition, we believe low-energy processes constitute a better alternative to enable the industrial application of single-molecule devices based on 2D materials. The present work addresses the postsynthesis processing of graphene at unconventional low temperature, low energy, and low pressure in the poly methyl-methacrylate- (PMMA-) assisted transfer of graphene to oxide wafer, in the electron-beam lithography with PMMA, and in the plasma patterning of graphene with a PMMA ribbon mask. During the exposure to the oxygen plasma, unprotected areas of graphene are converted to graphene oxide. The exposure time required to produce the ribbon patterns on graphene is 2 minutes. We produce ...