Estudio de un magnetrón utilizando el método de elementos finitos

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Magnetron sputtering system is a technique that consists in extracting atoms from a target material by collisions of energetic ions of an inert gas. It is widely used in semiconductor industries and materials processing research for developing thin films by deposition. During this process a low temp...

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Detalles Bibliográficos
Autor: Pérez Caro, Erik Alfredo
Formato: tesis de grado
Fecha de Publicación:2021
Institución:Pontificia Universidad Católica del Perú
Repositorio:PUCP-Tesis
Lenguaje:inglés
OAI Identifier:oai:tesis.pucp.edu.pe:20.500.12404/18054
Enlace del recurso:http://hdl.handle.net/20.500.12404/18054
Nivel de acceso:acceso abierto
Materia:Método de elementos finitos
Películas delgadas
Método de Monte Carlo
https://purl.org/pe-repo/ocde/ford#1.03.00
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dc.title.es_ES.fl_str_mv Estudio de un magnetrón utilizando el método de elementos finitos
title Estudio de un magnetrón utilizando el método de elementos finitos
spellingShingle Estudio de un magnetrón utilizando el método de elementos finitos
Pérez Caro, Erik Alfredo
Método de elementos finitos
Películas delgadas
Método de Monte Carlo
https://purl.org/pe-repo/ocde/ford#1.03.00
title_short Estudio de un magnetrón utilizando el método de elementos finitos
title_full Estudio de un magnetrón utilizando el método de elementos finitos
title_fullStr Estudio de un magnetrón utilizando el método de elementos finitos
title_full_unstemmed Estudio de un magnetrón utilizando el método de elementos finitos
title_sort Estudio de un magnetrón utilizando el método de elementos finitos
author Pérez Caro, Erik Alfredo
author_facet Pérez Caro, Erik Alfredo
author_role author
dc.contributor.advisor.fl_str_mv Torreblanca Quiroz, Humberto
dc.contributor.author.fl_str_mv Pérez Caro, Erik Alfredo
dc.subject.es_ES.fl_str_mv Método de elementos finitos
Películas delgadas
Método de Monte Carlo
topic Método de elementos finitos
Películas delgadas
Método de Monte Carlo
https://purl.org/pe-repo/ocde/ford#1.03.00
dc.subject.ocde.es_ES.fl_str_mv https://purl.org/pe-repo/ocde/ford#1.03.00
description Magnetron sputtering system is a technique that consists in extracting atoms from a target material by collisions of energetic ions of an inert gas. It is widely used in semiconductor industries and materials processing research for developing thin films by deposition. During this process a low temperature capacitively coupled plasma is generated near the cathode and several variations of the properties of this plasma can affect the thin film deposition process and quality. An approach to study these types of systems is by computational modeling. The use of robust computational codes that can handle complicated geometries and can solve complex systems of differential equations. In this present project we aim to model numerically a system of magnetrons developed at the Materials Science and Renewable Energies (MatER) laboratory. Using the geometry measurements and the material properties of each component taken in the laboratory, a CAD geometry was developed. Furthermore, the electric and magnetic fields are solved for the geometry configuration and, by implementing a Monte Carlo simulation, the electron trajectories and velocity distributions in the system are calculated. Finally, we use a multi-fluid model to solve a simplified system of a 1 dimensional capacitively coupled plasma and recover the system properties. The method to solve the respective system of equations is the finite element method implemented in the software COMSOL Multiphysics.
publishDate 2021
dc.date.accessioned.none.fl_str_mv 2021-02-01T18:18:50Z
dc.date.available.none.fl_str_mv 2021-02-01T18:18:50Z
dc.date.created.none.fl_str_mv 2021
dc.date.issued.fl_str_mv 2021-02-01
dc.type.es_ES.fl_str_mv info:eu-repo/semantics/bachelorThesis
format bachelorThesis
dc.identifier.uri.none.fl_str_mv http://hdl.handle.net/20.500.12404/18054
url http://hdl.handle.net/20.500.12404/18054
dc.language.iso.es_ES.fl_str_mv eng
language eng
dc.relation.ispartof.fl_str_mv SUNEDU
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eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by/2.5/pe/
dc.publisher.es_ES.fl_str_mv Pontificia Universidad Católica del Perú
dc.publisher.country.es_ES.fl_str_mv PE
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spelling Torreblanca Quiroz, HumbertoPérez Caro, Erik Alfredo2021-02-01T18:18:50Z2021-02-01T18:18:50Z20212021-02-01http://hdl.handle.net/20.500.12404/18054Magnetron sputtering system is a technique that consists in extracting atoms from a target material by collisions of energetic ions of an inert gas. It is widely used in semiconductor industries and materials processing research for developing thin films by deposition. During this process a low temperature capacitively coupled plasma is generated near the cathode and several variations of the properties of this plasma can affect the thin film deposition process and quality. An approach to study these types of systems is by computational modeling. The use of robust computational codes that can handle complicated geometries and can solve complex systems of differential equations. In this present project we aim to model numerically a system of magnetrons developed at the Materials Science and Renewable Energies (MatER) laboratory. Using the geometry measurements and the material properties of each component taken in the laboratory, a CAD geometry was developed. Furthermore, the electric and magnetic fields are solved for the geometry configuration and, by implementing a Monte Carlo simulation, the electron trajectories and velocity distributions in the system are calculated. Finally, we use a multi-fluid model to solve a simplified system of a 1 dimensional capacitively coupled plasma and recover the system properties. The method to solve the respective system of equations is the finite element method implemented in the software COMSOL Multiphysics.engPontificia Universidad Católica del PerúPEinfo:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by/2.5/pe/Método de elementos finitosPelículas delgadasMétodo de Monte Carlohttps://purl.org/pe-repo/ocde/ford#1.03.00Estudio de un magnetrón utilizando el método de elementos finitosinfo:eu-repo/semantics/bachelorThesisreponame:PUCP-Tesisinstname:Pontificia Universidad Católica del Perúinstacron:PUCPSUNEDUBachiller en Ciencias con mención en FísicaBachilleratoPontificia Universidad Católica del Perú. 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