Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering

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Terbium-doped aluminum nitride thin films have been deposited by radio frequency magnetron sputtering. The influence of annealing treatments on structural, morphological and luminescence properties of the films is examined with the aim to optimize post-deposition annealing conditions. Temperatures s...

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Detalles Bibliográficos
Autores: Tucto Salinas K.Y., Flores Escalante L.F., Guerra Torres J.A., Grieseler R., Kups T., Pezoldt J., Osvet A., Batentschuk M., Weingärtner R.
Formato: artículo
Fecha de Publicación:2017
Institución:Consejo Nacional de Ciencia Tecnología e Innovación
Repositorio:CONCYTEC-Institucional
Lenguaje:inglés
OAI Identifier:oai:repositorio.concytec.gob.pe:20.500.12390/2789
Enlace del recurso:https://hdl.handle.net/20.500.12390/2789
https://doi.org/10.4028/www.scientific.net/MSF.890.299
Nivel de acceso:acceso abierto
Materia:Wide bandgap semiconductor
Aluminum nitride
Cathodoluminescence
Photoluminescence excitation
Rare earths
Terbium
http://purl.org/pe-repo/ocde/ford#2.04.01
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oai_identifier_str oai:repositorio.concytec.gob.pe:20.500.12390/2789
network_acronym_str CONC
network_name_str CONCYTEC-Institucional
repository_id_str 4689
dc.title.none.fl_str_mv Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
title Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
spellingShingle Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
Tucto Salinas K.Y.
Wide bandgap semiconductor
Aluminum nitride
Cathodoluminescence
Photoluminescence excitation
Rare earths
Terbium
http://purl.org/pe-repo/ocde/ford#2.04.01
title_short Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
title_full Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
title_fullStr Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
title_full_unstemmed Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
title_sort Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering
author Tucto Salinas K.Y.
author_facet Tucto Salinas K.Y.
Flores Escalante L.F.
Guerra Torres J.A.
Grieseler R.
Kups T.
Pezoldt J.
Osvet A.
Batentschuk M.
Weingärtner R.
author_role author
author2 Flores Escalante L.F.
Guerra Torres J.A.
Grieseler R.
Kups T.
Pezoldt J.
Osvet A.
Batentschuk M.
Weingärtner R.
author2_role author
author
author
author
author
author
author
author
dc.contributor.author.fl_str_mv Tucto Salinas K.Y.
Flores Escalante L.F.
Guerra Torres J.A.
Grieseler R.
Kups T.
Pezoldt J.
Osvet A.
Batentschuk M.
Weingärtner R.
dc.subject.none.fl_str_mv Wide bandgap semiconductor
topic Wide bandgap semiconductor
Aluminum nitride
Cathodoluminescence
Photoluminescence excitation
Rare earths
Terbium
http://purl.org/pe-repo/ocde/ford#2.04.01
dc.subject.es_PE.fl_str_mv Aluminum nitride
Cathodoluminescence
Photoluminescence excitation
Rare earths
Terbium
dc.subject.ocde.none.fl_str_mv http://purl.org/pe-repo/ocde/ford#2.04.01
description Terbium-doped aluminum nitride thin films have been deposited by radio frequency magnetron sputtering. The influence of annealing treatments on structural, morphological and luminescence properties of the films is examined with the aim to optimize post-deposition annealing conditions. Temperatures starting from 500 up to 1000°C using two annealing techniques were investigated: rapid thermal processing and quartz tube furnace. X-ray diffraction analysis revealed the formation of aluminum oxide and aluminum oxynitride phases at temperatures higher than 750°C. The oxygen content in the surface layer was measured with energy dispersive X-ray. The terbium emission was obtained after excitation either by photons or electrons. The films treated with rapid thermal processing at 750°C resulted in the highest emission. © 2017 Trans Tech Publications, Switzerland.
publishDate 2017
dc.date.accessioned.none.fl_str_mv 2024-05-30T23:13:38Z
dc.date.available.none.fl_str_mv 2024-05-30T23:13:38Z
dc.date.issued.fl_str_mv 2017
dc.type.none.fl_str_mv info:eu-repo/semantics/article
format article
dc.identifier.uri.none.fl_str_mv https://hdl.handle.net/20.500.12390/2789
dc.identifier.doi.none.fl_str_mv https://doi.org/10.4028/www.scientific.net/MSF.890.299
dc.identifier.scopus.none.fl_str_mv 2-s2.0-85016419055
url https://hdl.handle.net/20.500.12390/2789
https://doi.org/10.4028/www.scientific.net/MSF.890.299
identifier_str_mv 2-s2.0-85016419055
dc.language.iso.none.fl_str_mv eng
language eng
dc.relation.ispartof.none.fl_str_mv Materials Science Forum
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.publisher.none.fl_str_mv Trans Tech Publications Ltd
publisher.none.fl_str_mv Trans Tech Publications Ltd
dc.source.none.fl_str_mv reponame:CONCYTEC-Institucional
instname:Consejo Nacional de Ciencia Tecnología e Innovación
instacron:CONCYTEC
instname_str Consejo Nacional de Ciencia Tecnología e Innovación
instacron_str CONCYTEC
institution CONCYTEC
reponame_str CONCYTEC-Institucional
collection CONCYTEC-Institucional
repository.name.fl_str_mv Repositorio Institucional CONCYTEC
repository.mail.fl_str_mv repositorio@concytec.gob.pe
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spelling Publicationrp01105600rp01108600rp01109600rp01106600rp01102600rp01104600rp01107600rp01103600rp00714600Tucto Salinas K.Y.Flores Escalante L.F.Guerra Torres J.A.Grieseler R.Kups T.Pezoldt J.Osvet A.Batentschuk M.Weingärtner R.2024-05-30T23:13:38Z2024-05-30T23:13:38Z2017https://hdl.handle.net/20.500.12390/2789https://doi.org/10.4028/www.scientific.net/MSF.890.2992-s2.0-85016419055Terbium-doped aluminum nitride thin films have been deposited by radio frequency magnetron sputtering. The influence of annealing treatments on structural, morphological and luminescence properties of the films is examined with the aim to optimize post-deposition annealing conditions. Temperatures starting from 500 up to 1000°C using two annealing techniques were investigated: rapid thermal processing and quartz tube furnace. X-ray diffraction analysis revealed the formation of aluminum oxide and aluminum oxynitride phases at temperatures higher than 750°C. The oxygen content in the surface layer was measured with energy dispersive X-ray. The terbium emission was obtained after excitation either by photons or electrons. The films treated with rapid thermal processing at 750°C resulted in the highest emission. © 2017 Trans Tech Publications, Switzerland.Consejo Nacional de Ciencia, Tecnología e Innovación Tecnológica - ConcytecengTrans Tech Publications LtdMaterials Science Foruminfo:eu-repo/semantics/openAccessWide bandgap semiconductorAluminum nitride-1Cathodoluminescence-1Photoluminescence excitation-1Rare earths-1Terbium-1http://purl.org/pe-repo/ocde/ford#2.04.01-1Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputteringinfo:eu-repo/semantics/articlereponame:CONCYTEC-Institucionalinstname:Consejo Nacional de Ciencia Tecnología e Innovacióninstacron:CONCYTEC20.500.12390/2789oai:repositorio.concytec.gob.pe:20.500.12390/27892024-05-30 16:11:23.661http://purl.org/coar/access_right/c_14cbinfo:eu-repo/semantics/closedAccessmetadata only accesshttps://repositorio.concytec.gob.peRepositorio Institucional CONCYTECrepositorio@concytec.gob.pe#PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE##PLACEHOLDER_PARENT_METADATA_VALUE#<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="0d782970-b338-444a-9769-916919c27cce"> <Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type> <Language>eng</Language> <Title>Effect of post-annealing treatment on the structure and luminescence properties of AIN: Tb3+thin films prepared by radio frequency magnetron sputtering</Title> <PublishedIn> <Publication> <Title>Materials Science Forum</Title> </Publication> </PublishedIn> <PublicationDate>2017</PublicationDate> <DOI>https://doi.org/10.4028/www.scientific.net/MSF.890.299</DOI> <SCP-Number>2-s2.0-85016419055</SCP-Number> <Authors> <Author> <DisplayName>Tucto Salinas K.Y.</DisplayName> <Person id="rp01105" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Flores Escalante L.F.</DisplayName> <Person id="rp01108" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Guerra Torres J.A.</DisplayName> <Person id="rp01109" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Grieseler R.</DisplayName> <Person id="rp01106" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Kups T.</DisplayName> <Person id="rp01102" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Pezoldt J.</DisplayName> <Person id="rp01104" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Osvet A.</DisplayName> <Person id="rp01107" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Batentschuk M.</DisplayName> <Person id="rp01103" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> <Author> <DisplayName>Weingärtner R.</DisplayName> <Person id="rp00714" /> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> </Authors> <Editors> </Editors> <Publishers> <Publisher> <DisplayName>Trans Tech Publications Ltd</DisplayName> <OrgUnit /> </Publisher> </Publishers> <Keyword>Wide bandgap semiconductor</Keyword> <Keyword>Aluminum nitride</Keyword> <Keyword>Cathodoluminescence</Keyword> <Keyword>Photoluminescence excitation</Keyword> <Keyword>Rare earths</Keyword> <Keyword>Terbium</Keyword> <Abstract>Terbium-doped aluminum nitride thin films have been deposited by radio frequency magnetron sputtering. The influence of annealing treatments on structural, morphological and luminescence properties of the films is examined with the aim to optimize post-deposition annealing conditions. Temperatures starting from 500 up to 1000°C using two annealing techniques were investigated: rapid thermal processing and quartz tube furnace. X-ray diffraction analysis revealed the formation of aluminum oxide and aluminum oxynitride phases at temperatures higher than 750°C. The oxygen content in the surface layer was measured with energy dispersive X-ray. The terbium emission was obtained after excitation either by photons or electrons. The films treated with rapid thermal processing at 750°C resulted in the highest emission. © 2017 Trans Tech Publications, Switzerland.</Abstract> <Access xmlns="http://purl.org/coar/access_right" > </Access> </Publication> -1
score 13.0672035
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